Optical microlithography XIX
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Optical microlithography XIX 21-24 February, 2006, San Jose, California, USA by

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Published by SPIE in Bellingham, Wash .
Written in English


  • Integrated circuits -- Masks -- Congresses,
  • Microlithography -- Congresses,
  • X-ray lithography -- Congresses,
  • Manufacturing processes -- Congresses

Book details:

Edition Notes

Includes bibliographical references and author index.

Other titlesOptical microlithography 19, Optical microlithography nineteen
StatementDonis G. Flagello, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc. (USA).
SeriesProceedings of SPIE -- v. 6154, Proceedings of SPIE--the International Society for Optical Engineering -- v. 6154.
ContributionsFlagello, Donis G., Society of Photo-optical Instrumentation Engineers., International SEMATECH.
LC ClassificationsTK7835 .O664 2006
The Physical Object
Paginationv. <2> :
ID Numbers
Open LibraryOL22525933M
ISBN 100819461970
ISBN 109780819461971
LC Control Number2007280592

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Book Description. This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar. Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Book chapters or sections. Monitoring polarization at nm high-NA with phase shift masks," in Optical Microlithography XIX, D. G. Flagello, Ed., Proceedings of SPIE, Vol. , Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, Inverse lithography technology at chip scale,” presented at the SPIE Optical Microlithography XIX () by B Lin, M Shieh, J Sun, J Ho, Y Wang, X Wu, W Leitermann, O Lin, J Lin, Y Liu, L Pang Add To MetaCart. Tools. Sorted by: Results 1 - 3 of 3. Mask Design for Optical Microlithography–An Inverse Imaging Problem.

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